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The 172nm Excimer UV Device delivers high-energy photo-cleaning and nano-level surface modification for semiconductors, batteries, and advanced materials. Utilizing cold 172nm UV photons, this compact system breaks organic chemical bonds and oxidizes contaminants without substrate damage. With a high uniformity of ±15% and operating temperatures under 40°C, it provides an eco-friendly, low-consumption alternative to traditional low-pressure mercury lamps.
Pre-Bonding Surface Activation R&D
Pre-Deposition Wafer Cleaning Trials
FMM & Photomask Damage-Free Cleaning
Advanced Material Surface Modification
