


Wafer & FMM cleaning
Film matting & coating
Cold plate organic particle removal
Hydrophilic modification
Engineered for ultrapure water (UPW) systems, this eco-friendly, mercury-free 172nm VUV module triggers powerful radical oxidation to reduce TOC down to ppb levels. By converting organic compounds into trace CO₂ and H₂O, it delivers an ideal water-purification solution for semiconductors, pharmaceuticals, and laboratories. Its smart modular design simplifies onsite maintenance and system scaling, with custom power levels and flow rates fully supported.
Semiconductor UPW TOC
Pharma Pure Water TOC
Lab Ultrapure Water
Online TOC Reduction Systems
Enhance your surface treatment precision with GMY’s 172nm Excimer Lamps. Utilizing advanced photochemical oxidation, our mercury-free 172nm UV light solutions effectively break down organic contaminants to achieve atomic-level cleanliness on semiconductor wafers, display substrates, and optical devices.
Display Substrates
Semiconductor Silicon WafersIntegrated Circuits
Integrated Circuits
Optical Devices
LCDs Production
Electronic Paper
AR Lenses
Micro-Nano Manufacturing
Discover GMY's high-efficiency 172nm excimer lamps for industrial photocuring. Mercury-free, powerful 350W-1000W VUV light for rapid surface crosslinking, matte finishing, and PPF/PCB coating modification. Compared to traditional UV curing, it shortens curing time and enhances surface modification effects.
Paint Protection Films
Soft-Touch Panels
Coating Equipment
Paper & Packaging Inks
Furniture Inks
Automotive Inks & Related Coatings
Pigmented & Clear Coatings
PCB Inks
Adhesive Coatings
3D Printing
The GMY 172nm Photomodification Module serves as the premier vacuum-compatible solution for activating the hydrophilicity of dental implants. Through precise 172nm excimer technology, the module purifies titanium surfaces by breaking down organic hydrocarbons, which drastically enhances TiO2 bioactivity and osseointegration. Designed for seamless device integration, this module stands out with its high power output, minimal thermal impact, rapid reaction cycle, and extensive, homogeneous beam coverage.
Surface Modification
Organic Contaminants Removal
Ultra-fine Cleaning
The 172nm MINl excimer module is a compact,plug-and-play desktop solution for semiconductor R&D and laboratory validation. Delivering short-wave vacuum ultraviolet (VUV) radiation, it cleaves molecular bonds to eliminate organic contaminants and modify surface energy without substrate damage, providing an agile process-validation platform for research labs and universities.
Flexible display
Optical thin films
Pretreatment before coating
The 172nm Excimer UV Device delivers high-energy photo-cleaning and nano-level surface modification for semiconductors, batteries, and advanced materials. Utilizing cold 172nm UV photons, this compact system breaks organic chemical bonds and oxidizes contaminants without substrate damage. With a high uniformity of ±15% and operating temperatures under 40°C, it provides an eco-friendly, low-consumption alternative to traditional low-pressure mercury lamps.
Pre-Bonding Surface Activation R&D
Pre-Deposition Wafer Cleaning Trials
FMM & Photomask Damage-Free Cleaning
Advanced Material Surface Modification
GMY 172nm excimer lamps offer high-energy VUV radiation to degrade TOC to ppb levels in ultrapure water. Mercury-free 15W/20W lamps for industrial water treatment. By generating free radicals, our UV light systems oxidize organic matter into CO₂ and H₂O molecules. This advanced technology is particularly suitable for ultra-pure water production.
Ultrapure Water TOC Removal
Drinking Water Trace Pollutants
Decomposition of Pesticide Residues
Textile Dye Wastewater Treatment
High-Purity Ozone Generation