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Enhance your surface treatment precision with GMY’s 172nm Excimer Lamps. Utilizing advanced photochemical oxidation, our mercury-free 172nm UV light solutions effectively break down organic contaminants to achieve atomic-level cleanliness on semiconductor wafers, display substrates, and optical devices.
| Model | Power (W) | UV Irradiance @6mm | Size (Diameter × Length) | Emission Length | Cooling Method | Dielectric Barrier Discharge Type | Power Supply Model | Application | |||
|---|---|---|---|---|---|---|---|---|---|---|---|
| Cleaning | Modification | Curing | Ultrapure Water / TOC Degradation | ||||||||
| 172E1000D40×1532 | 1000W | > 65 mW/cm² | φ40 × 1532 mm | 1390 mm | Water | Double Dielectric | MC | √ | √ | √ | - |
| 172E860D40×957 | 860W | > 65 mW/cm² | φ40 × 957 mm | 860 mm | Nitrogen | Double Dielectric | MC | √ | √ | √ | - |
| 172E800D40×1750 | 800W | > 65 mW/cm² | φ40 × 1750 mm | 1598 mm | Nitrogen | Single Dielectric | MC | √ | √ | √ | - |
| 172E500D40×495 | 500W | > 65 mW/cm² | φ40 × 495 mm | 353 mm | Nitrogen | Single Dielectric | MC | √ | √ | √ | - |
| 172E350D40×495 | 350W | > 65 mW/cm² | φ40 × 495 mm | 353 mm | Water | Double Dielectric | MC | √ | √ | √ | - |
| 172E180D26.5×460 | 180W | > 75 mW/cm² | φ26.5 × 460 mm | 350 mm | Water | Double Dielectric | MC | √ | √ | √ | - |
| 172E350D26.5×730 | 350W | > 60 mW/cm² | φ26.5 × 730 mm | 620 mm | Water | Double Dielectric | MC | √ | √ | √ | - |
| 172E15D16.5×80 | 15W | > 23 mW/cm² | φ16.5 × 80 mm | 55 mm | / | Single Dielectric | ZX | - | - | - | √ |
| 172E20D16.5×141 | 20W | > 25 mW/cm² | φ16.5 × 141 mm | 75 mm | / | Single Dielectric | ZX | - | - | - | √ |
| 172E5D9×85 | 5W | > 10 mW/cm² | φ9 × 85 mm | 50 mm | / | Single Dielectric | ZX | - | - | - | √ |
Note: Custom specifications for power, size, and matching power supplies are available upon request.
Enhance your surface treatment precision with GMY’s 172nm Excimer Lamps. Utilizing photochemical oxidation, our mercury-free 172nm UV light solutions effectively break down organic contaminants to achieve atomic-level cleanliness on semiconductor wafers, display substrates, and optical devices.
The 172nm Excimer Lamp is a next-generation vacuum ultraviolet light source engineered specifically for high-efficiency dry cleaning and surface modification. Operating on the principle of direct photochemical oxidation, the 172nm VUV photons carry energy to break molecular bonds of organic contaminants on the material's surface. Simultaneously, the light reacts with ambient oxygen leaving the target surface at an atomic cleanliness level without damaging the substrate structure.
172nm excimer light excites free radicals on organic surfaces, which combine with oxygen radicals in an oxidation reaction to efficiently break down organics into water and CO2, achieving atomic-level cleanliness. Material cleaning for display substrates, semiconductor silicon wafers, integrated circuits, optical components, LCDs, e-paper, AR lenses, and micro-nano manufacturing.
172nm excimer light rapidly initiates polymerization reactions. Through innovative processing techniques, it ensures firm adhesion of inks with bright, long-lasting colors while providing a matte, smooth finish with anti-fingerprint properties. Curing of paint protection films (PPF), skin-feel panels, coating equipment, paper inks, packaging inks, furniture inks, automotive inks and related coatings, colored and clear paints, PCB inks, adhesive coatings, and 3D printing materials.
172nm excimer light sources are used for surface modification of materials to enhance properties such as surface hydrophilicity and adhesion. Surface modification for processes including pre-treatment for film deposition, MEMS packaging, 3D packaging, wafer bonding, as well as hydrophilic modification of dental implants, battery materials, titanium, aluminum foil, and other materials.
High-energy 172nm excimer light is used to efficiently and rapidly degrade total organic carbon (TOC) in water to ppb levels, meeting ultrapure water quality standards. TOC removal in ultrapure water production, treatment of trace organic pollutants in drinking water, degradation of pesticide residues, photocatalytic decolorization of textile dyeing wastewater, and high-purity ozone generation.
100% eco-friendly vacuum UV treatment fully compliant with international RoHS restrictions, eliminating dangerous mercury hazards and disposal risks from cleanrooms.
Emits high-energy VUV wavelengths to continuously ionize ambient oxygen molecules, producing heavy-density reactive hydroxyl radicals (HO*) for rapid organic bond cleavage.
Backed by mass industrial scale manufacturing lines, ensuring complete batch uniformity, rigorous pre-shipment aging tests, and bulletproof supply chain reliability.
Tailored arc lengths, envelope dimensions, multi-pin electrical cap terminals, and matching ballast controls to achieve seamless mechanical integration into custom tools.
Certified quality management system ensuring premium manufacture standard.
Fully compliant with European health, safety, and environmental protection legislation.
Eco-friendly manufacture completely free from hazardous substances.
Premium North American electric security and fire prevention compliance standard.
Engineered for ultrapure water (UPW) systems, this eco-friendly, mercury-free 172nm VUV module triggers powerful radical oxidation to reduce TOC down to ppb levels. By converting organic compounds into trace CO₂ and H₂O, it delivers an ideal water-purification solution for semiconductors, pharmaceuticals, and laboratories. Its smart modular design simplifies onsite maintenance and system scaling, with custom power levels and flow rates fully supported.
Enhance your surface treatment precision with GMY’s 172nm Excimer Lamps. Utilizing advanced photochemical oxidation, our mercury-free 172nm UV light solutions effectively break down organic contaminants to achieve atomic-level cleanliness on semiconductor wafers, display substrates, and optical devices.
Discover GMY's high-efficiency 172nm excimer lamps for industrial photocuring. Mercury-free, powerful 350W-1000W VUV light for rapid surface crosslinking, matte finishing, and PPF/PCB coating modification. Compared to traditional UV curing, it shortens curing time and enhances surface modification effects.
The GMY 172nm Photomodification Module serves as the premier vacuum-compatible solution for activating the hydrophilicity of dental implants. Through precise 172nm excimer technology, the module purifies titanium surfaces by breaking down organic hydrocarbons, which drastically enhances TiO2 bioactivity and osseointegration. Designed for seamless device integration, this module stands out with its high power output, minimal thermal impact, rapid reaction cycle, and extensive, homogeneous beam coverage.
GMY 172nm excimer lamps offer high-energy VUV radiation to degrade TOC to ppb levels in ultrapure water. Mercury-free 15W/20W lamps for industrial water treatment. By generating free radicals, our UV light systems oxidize organic matter into CO₂ and H₂O molecules. This advanced technology is particularly suitable for ultra-pure water production.
The 172nm Excimer UV Device delivers high-energy photo-cleaning and nano-level surface modification for semiconductors, batteries, and advanced materials. Utilizing cold 172nm UV photons, this compact system breaks organic chemical bonds and oxidizes contaminants without substrate damage. With a high uniformity of ±15% and operating temperatures under 40°C, it provides an eco-friendly, low-consumption alternative to traditional low-pressure mercury lamps.
