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Ultrapure Water TOC Degradation 172nm Excimer Lamp
ultrapure water UV lamp
VUV excimer light
Dielectric barrier discharge lamp
Inline TOC reduction UV lamp
Inline TOC reduction UV lamp
Trace organic contaminants removal UV lamp

Ultrapure Water TOC Degradation 172nm Excimer Lamp

GMY 172nm excimer lamps offer high-energy VUV radiation to degrade TOC to ppb levels in ultrapure water. Mercury-free 15W/20W lamps for industrial water treatment. By generating free radicals, our UV light systems oxidize organic matter into CO₂ and H₂O molecules. This advanced technology is particularly suitable for ultra-pure water production.

  • Product Specifications

    Model Power UV Irradiance @6mm Tube Size (Diameter × Length) Emission Length Product Code
    172E15D16.5×80 15W >23 mW/cm² φ16.5 × 80 mm 55 mm A5201201001000
    172E20D16.5×141 20W >23 mW/cm² φ16.5 × 141 mm 75 mm A5201211001000

     

    172nm Excimer Lamps - TOC Degradation

    GMY 172nm Excimer Water Treatment Solution utilizes deep vacuum ultraviolet technology to deliver efficient total organic carbon reduction.Operating at a strict monochromatic 172nm wavelength,this light source breaks down trace organic contaminants directly to single-digit ppb levels,meeting rigorous ultrapure industrial water standards.

    By driving powerful photolysis without introducing thermal distortion or external chemical elements,our systems ensure purity, establishing a high-efficiency benchmark for modern advanced oxidation processes.

    Application Fields

    AI Server Cold Plate Organic Particle Removal

    172nm VUV photons directly photolyze organic contaminants on cold plate surfaces, reducing both the size and count of organic particles in the liquid cooling loop. This UV-driven cold plate cleaning method replaces or supplements chemical flushing, ensuring AI server thermal performance and CDU system reliability.

    CDU Makeup Water TOC Reduction

    Inline 172nm UV module installed directly in CDU (Coolant Distribution Unit) makeup water loops. Generates radical oxidation to break down dissolved organic compounds, lowering TOC to single-digit ppb and reducing organic particle load in recirculating AI liquid cooling water.
    Target: CDU makeup water TOC removal UV / 172nm UV lamp CDU water treatment

    Semiconductor UPW TOC Removal

    For ultrapure water (UPW) loops in semiconductor fabs: 172nm VUV photons rapidly oxidize trace organic molecules to CO2 and H2O, achieving ppb-level TOC control. Supports ITRS 7nm/5nm roadmap purity requirements.
    Target: UPW TOC removal UV lamp / UV TOC reduction ultrapure water

    Lab-Scale UPW Systems

    Compact 172nm VUV organic mineralization core for high-end laboratory water apparatus. Modular plug-in design supports easy integration and replacement.

    Key Features

    01 Mercury-Free Operation

    100% mercury-free VUV technology. Safely integrates into semiconductor, pharmaceutical, and food-grade ultrapure water loops with zero risk of heavy metal leakage or pollution.

    02 Highly Energetic Photons Generate Hydroxyl Radicals (HO*)

    Emits high-energy 172nm photons that directly cleave water molecules to generate active hydroxyl radicals (HO•), rapidly oxidizing persistent organic trace elements.

    03 Consistent Quality and Reliable Delivery with Large Production Capacity

    Built on automated precision manufacturing lines, providing stable monochromatic output (>23 mW/cm²) and dependable spectral performance for critical industrial systems.

    04 Customizable Lamp Design for Flexible Application

    Flexible custom specifications available for lamp length, diameters, electrical terminals, and integrated electronic ballast pairings to align with multi-ton treatment chambers.

    Certifications & Compliance

    ISO Certificate
    ISO

    ISO 9001/14001

    Certified quality management system ensuring premium manufacturing standards.

    CE Certified Declaration
    CE

    CE Certified

    Fully compliant with European health, safety, and environmental protection legislation.

    ROHS Compliance Certificate
    RoHS

    ROHS Compliant

    Eco-friendly manufacturing completely free from hazardous substances.

    UL Safety Certificate
    UL

    UL Certified

    Premium North American electrical security and fire prevention compliance standard.

    FAQ

    Q How does the 172nm excimer lamp achieve deep TOC degradation?

    Standard 185nm UV lamps rely entirely on a longer oxidation path. In contrast, 172nm vacuum ultraviolet (VUV) photons carry intense energy that splits organic molecular carbon chains directly. Concurrently, it photolyzes water molecules to generate a localized density of hydroxyl radicals (HO•), rapidly reducing refractory organics down to ppb levels.

    Q Does this 172nm excimer light require warm-up time during water processing?

    No, unlike conventional gas discharge UV lamps that require 5 to 10 minutes to stabilize, our 172nm excimer lamps offer instant on/off performance. It delivers full rated energy output (>23 mW/cm²) immediately upon activation, preventing un-treated water from passing through the reactor loops during system starts.

    Q Why is a specialized electronic ballast necessary for these 15W/20W lamps?

    Excimer gas mixtures require customized high-frequency, high-voltage ignition pulses to maintain a homogeneous dielectric barrier discharge (DBD). Standard UV ballasts cannot supply this specific electrical waveform. To maximize lamp operational life and maintain uniform VUV output, matching GMY electronic ballasts are mandatory.
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