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Engineered for ultrapure water (UPW) systems, this eco-friendly, mercury-free 172nm VUV module triggers powerful radical oxidation to reduce TOC down to ppb levels. By converting organic compounds into trace CO₂ and H₂O, it delivers an ideal water-purification solution for semiconductors, pharmaceuticals, and laboratories. Its smart modular design simplifies onsite maintenance and system scaling, with custom power levels and flow rates fully supported.
Treatment Uniformity :
±10%172nm Irradiance (Center Point) :
>20 mW/cm² (@1mm)Average Service Life :
1,000 hrs (irradiance ≥70%)Operating Voltage :
AC 2.0kV +20%Lamp Power :
20W ±10%172nm Excimer Module for AI Cold Plate Organic Particle Removal, CDU Water TOC Reduction & Ultrapure Water Purification
The GMY 172nm VUV excimer lamp module is engineered for two critical liquid-cooling and water-purification applications in AI infrastructure: (1) AI server cold plate organic particle removal — the 172nm vacuum-ultraviolet photon stream photolytically breaks down organic molecules on cold plate surfaces, drastically reducing particle count and size in the liquid cooling loop; and (2) CDU makeup water TOC reduction — operating inside CDU water lines, it generates radical oxidation to reduce Total Organic Carbon in ultrapure water to ppb levels, replacing chemical dosing.
As a mercury-free, instant-on module delivering >20 mW/cm² at 1mm, it serves as a cost-effective China alternative , with full OEM customization for flow rate, wattage, and interface sizing.
OUR Advantages：
172nm VUV photons directly photolyze organic contaminants on cold plate surfaces, reducing both the size and count of organic particles in the liquid cooling loop. This UV-driven cold plate cleaning method replaces or supplements chemical flushing, ensuring AI server thermal performance and CDU system reliability.
Inline 172nm UV module installed directly in CDU (Coolant Distribution Unit) makeup water loops. Generates radical oxidation to break down dissolved organic compounds, lowering TOC to single-digit ppb and reducing organic particle load in recirculating AI liquid cooling water.
Target: CDU makeup water TOC removal UV / 172nm UV lamp CDU water treatment
For ultrapure water (UPW) loops in semiconductor fabs: 172nm VUV photons rapidly oxidize trace organic molecules to CO2 and H2O, achieving ppb-level TOC control. Supports ITRS 7nm/5nm roadmap purity requirements.
Target: UPW TOC removal UV lamp / UV TOC reduction ultrapure water
Compact 172nm VUV organic mineralization core for high-end laboratory water apparatus. Modular plug-in design supports easy integration and replacement.
Delivers 20 mW/cm² (@1mm) for rapid TOC reduction to ppb levels.
Engineered for stable, long-term industrial cycles, retaining ≥70% intensity over 1,000 hours.
Restricts variation within tight thresholds to ensure homogeneous water purification.
Uses a corrosion-resistant quartz sleeve and modular layout to slash pipeline installation and swap costs.
Customizable in power capacity, interface sizing, and mounting styles to fit specific flow rates.
Adopts eco-friendly, mercury-free 172nm technology to meet global green regulations.
Backed by deep VUV manufacturing expertise, ensuring high batch consistency and punctual global delivery.
Certified quality management system ensuring premium manufacture standard.
Fully compliant with European health, safety, and environmental protection legislation.
Eco-friendly manufacture completely free from hazardous substances.
Premium North American electric security and fire prevention compliance standard.
Engineered for ultrapure water (UPW) systems, this eco-friendly, mercury-free 172nm VUV module triggers powerful radical oxidation to reduce TOC down to ppb levels. By converting organic compounds into trace CO₂ and H₂O, it delivers an ideal water-purification solution for semiconductors, pharmaceuticals, and laboratories. Its smart modular design simplifies onsite maintenance and system scaling, with custom power levels and flow rates fully supported.
Enhance your surface treatment precision with GMY’s 172nm Excimer Lamps. Utilizing advanced photochemical oxidation, our mercury-free 172nm UV light solutions effectively break down organic contaminants to achieve atomic-level cleanliness on semiconductor wafers, display substrates, and optical devices.
Discover GMY's high-efficiency 172nm excimer lamps for industrial photocuring. Mercury-free, powerful 350W-1000W VUV light for rapid surface crosslinking, matte finishing, and PPF/PCB coating modification. Compared to traditional UV curing, it shortens curing time and enhances surface modification effects.
The GMY 172nm Photomodification Module serves as the premier vacuum-compatible solution for activating the hydrophilicity of dental implants. Through precise 172nm excimer technology, the module purifies titanium surfaces by breaking down organic hydrocarbons, which drastically enhances TiO2 bioactivity and osseointegration. Designed for seamless device integration, this module stands out with its high power output, minimal thermal impact, rapid reaction cycle, and extensive, homogeneous beam coverage.
GMY 172nm excimer lamps offer high-energy VUV radiation to degrade TOC to ppb levels in ultrapure water. Mercury-free 15W/20W lamps for industrial water treatment. By generating free radicals, our UV light systems oxidize organic matter into CO₂ and H₂O molecules. This advanced technology is particularly suitable for ultra-pure water production.
The 172nm Excimer UV Device delivers high-energy photo-cleaning and nano-level surface modification for semiconductors, batteries, and advanced materials. Utilizing cold 172nm UV photons, this compact system breaks organic chemical bonds and oxidizes contaminants without substrate damage. With a high uniformity of ±15% and operating temperatures under 40°C, it provides an eco-friendly, low-consumption alternative to traditional low-pressure mercury lamps.
