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Model :
MO-D330-6Warranty :
1 yearIrradiance @1m :
>100 mW/cm²Uniformity :
±10%172nm Central Irradiance :
>70 mW/cm² @3mmAverage Service Life (Irradiance ≥70%) :
2,500 hrsSize :
(350×350mm irradiation window)Operating Humidity :
20%~80%Operating Temperature :
-5°C~30°CTotal Power :
1200W ±10%Input Voltage (V) :
AC 110~240VAs a professional Chinese excimer lamp manufacturer
172nm VUV light is highly oxidizing. It breaks down organic dirt and tiny particles on wafers—no residue. This ensures accurate semiconductor manufacturing.
172nm excimer lamps emit high-energy UV light. It removes impurities on OLED/display panel masks. This prevents pixel defects, fitting BOE, TCL CSOT production lines.
For FMM fine metal mask cleaning UV lamp, Invar mask cleaning 172nm excimer lamp,
OLED evaporation mask UV cleaning UV, 172nm VUV metal mask cleaning
172nm VUV light breaks down organics on these masks. It won’t damage the masks’ structure, ensuring accurate pixel positioning. This directly improves production yield.
172nm VUV roller coating system, excimer UV matting.
172nm excimer UV light modifies film surfaces. It creates a rough texture for matting and better coating adhesion. Works for continuous roller coating processing.
Surface irradiance > 100 mW/cm²; 70 mW/cm² (@3mm). Efficiently removes organic contaminants.
Premium electrodes & precise gas control. Over 2500h basic lifespan. 1000h warranty, decay < 30%. Up to 3000h+ for professional use.
Irradiation window 350×350mm, uniformity ±10%. Window size customizable per your requirements.
No preheating, instant start. Supports high-frequency operation and roll-to-roll roller coating system.
Reliable operation at -5°C ~ 30°C, perfect for cleanrooms and temperature-controlled areas.
Works with various production equipment. We offer customized solutions with fast delivery and zero development costs.
Utilizes a 172nm mercury-free UV light source, ensuring safety and environmental protection.
Supported by 30 years of experience in UV light field and equipment manufacturing, with large-scale production capability, high product consistency, stable performance, and reliable, on-time delivery.
Certified quality management system ensuring premium manufacturing standards.
Fully compliant with European health, safety, and environmental protection legislation.
Eco-friendly manufacturing completely free from hazardous substances.
Premium North American electrical security and fire prevention compliance standard.
The 172nm VUV excimer lamp generates high-energy vacuum ultraviolet light via gas discharge. It features high photon energy, far exceeding the bond energy of common organic molecules.
With strong molecular bond breaking capacity, the light directly decomposes organic contaminants. It also produces reactive oxygen species to enhance cleaning and TOC removal effects.
As a reliable Ushio excimer lamp alternative and Hamamatsu 172nm alternative, it fits semiconductor cleaning, cold plate cleaning, CDU & UPW water treatment, film matting and other industrial scenarios.
Engineered for ultrapure water (UPW) systems, this eco-friendly, mercury-free 172nm VUV module triggers powerful radical oxidation to reduce TOC down to ppb levels. By converting organic compounds into trace CO₂ and H₂O, it delivers an ideal water-purification solution for semiconductors, pharmaceuticals, and laboratories. Its smart modular design simplifies onsite maintenance and system scaling, with custom power levels and flow rates fully supported.
Enhance your surface treatment precision with GMY’s 172nm Excimer Lamps. Utilizing advanced photochemical oxidation, our mercury-free 172nm UV light solutions effectively break down organic contaminants to achieve atomic-level cleanliness on semiconductor wafers, display substrates, and optical devices.
Discover GMY's high-efficiency 172nm excimer lamps for industrial photocuring. Mercury-free, powerful 350W-1000W VUV light for rapid surface crosslinking, matte finishing, and PPF/PCB coating modification. Compared to traditional UV curing, it shortens curing time and enhances surface modification effects.
The GMY 172nm Photomodification Module serves as the premier vacuum-compatible solution for activating the hydrophilicity of dental implants. Through precise 172nm excimer technology, the module purifies titanium surfaces by breaking down organic hydrocarbons, which drastically enhances TiO2 bioactivity and osseointegration. Designed for seamless device integration, this module stands out with its high power output, minimal thermal impact, rapid reaction cycle, and extensive, homogeneous beam coverage.
GMY 172nm excimer lamps offer high-energy VUV radiation to degrade TOC to ppb levels in ultrapure water. Mercury-free 15W/20W lamps for industrial water treatment. By generating free radicals, our UV light systems oxidize organic matter into CO₂ and H₂O molecules. This advanced technology is particularly suitable for ultra-pure water production.
The 172nm Excimer UV Device delivers high-energy photo-cleaning and nano-level surface modification for semiconductors, batteries, and advanced materials. Utilizing cold 172nm UV photons, this compact system breaks organic chemical bonds and oxidizes contaminants without substrate damage. With a high uniformity of ±15% and operating temperatures under 40°C, it provides an eco-friendly, low-consumption alternative to traditional low-pressure mercury lamps.
