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172nm Excimer Lamp Module Semiconductor Wafer & Mask UV Cleaning FMM/Invar Film Matting
172nm excimer lamp module
172nm excimer surface treatment
PI film adhesion enhancement light
VUV contact angle reduction module
172nm cold UV light source
Mercury free 172nm light source

172nm Excimer Lamp Module Semiconductor Wafer & Mask UV Cleaning FMM/Invar Film Matting

It eliminates nanoscale organic contaminants. Widely used for semiconductor wafer UV cleaning, FMM fine metal mask cleaning, Invar mask cleaning, OLED evaporation mask cleaning and photomask cleaning. PCB UV cleaning, and excimer UV matting in roller coating lines. It serves as a cost-effective alternative for Hamamatsu and Ushio 172nm excimer lamps.
  • Model :

    MO-D330-6
  • Warranty :

    1 year
  • Irradiance @1m :

    >100 mW/cm²
  • Uniformity :

    ±10%
  • 172nm Central Irradiance :

    >70 mW/cm² @3mm
  • Average Service Life (Irradiance ≥70%) :

    2,500 hrs
  • Size :

    (350×350mm irradiation window)
  • Operating Humidity :

    20%~80%
  • Operating Temperature :

    -5°C~30°C
  • Total Power :

    1200W ±10%
  • Input Voltage (V) :

    AC 110~240V
  • GMY MO-D330-6 172nm Excimer Lamp Module

    As a professional Chinese excimer lamp manufacturer

    Our Advantages

    • 01. Customized solutions based on your application demands
    • 02. 30-45 days delivery from design to production
    • 03. Zero development cost | Customizable for single unit

    Application Fields

    Semiconductor wafer & Mask Cleaning

    Semiconductor Wafer & Mask Cleaning

    172nm VUV light is highly oxidizing. It breaks down organic dirt and tiny particles on wafers—no residue. This ensures accurate semiconductor manufacturing.

    OLED & Display Panel Mask Cleaning

    172nm excimer lamps emit high-energy UV light. It removes impurities on OLED/display panel masks. This prevents pixel defects, fitting BOE, TCL CSOT production lines.

    Organic particles & TOC Removal
    Film & Coating Production

    FMM & Invar & OLED evaporation metal mask Cleaning

    For FMM fine metal mask cleaning UV lamp,  Invar mask cleaning 172nm excimer lamp, 

    OLED evaporation mask UV cleaning UV, 172nm VUV metal mask cleaning 

    172nm VUV light breaks down organics on these masks. It won’t damage the masks’ structure, ensuring accurate pixel positioning. This directly improves production yield.

    Film & Coating Production excimer matting film production line

    172nm VUV roller coating system, excimer UV matting.

    172nm excimer UV light modifies film surfaces. It creates a rough texture for matting and better coating adhesion. Works for continuous roller coating processing.

    Cold Plate & AI Server Cleaning

    Key Features

    01 High-Intensity Output

    Surface irradiance > 100 mW/cm²; 70 mW/cm² (@3mm). Efficiently removes organic contaminants.

    02 Long Service Life

    Premium electrodes & precise gas control. Over 2500h basic lifespan. 1000h warranty, decay < 30%. Up to 3000h+ for professional use.

    03 Excellent Uniformity

    Irradiation window 350×350mm, uniformity ±10%. Window size customizable per your requirements.

    04 Instant Operation

    No preheating, instant start. Supports high-frequency operation and roll-to-roll roller coating system.

    05 High Adaptability

    Reliable operation at -5°C ~ 30°C, perfect for cleanrooms and temperature-controlled areas.

    06 Flexible Integration

    Works with various production equipment. We offer customized solutions with fast delivery and zero development costs.

    07 Mercury-Free Light Source

    Utilizes a 172nm mercury-free UV light source, ensuring safety and environmental protection.

    08 Professional and Reliable

    Supported by 30 years of experience in UV light field and equipment manufacturing, with large-scale production capability, high product consistency, stable performance, and reliable, on-time delivery.

    Certifications & Compliance

    ISO Certificate
    ISO

    ISO 9001/14001

    Certified quality management system ensuring premium manufacturing standards.

    CE Certified Declaration
    CE

    CE Certified

    Fully compliant with European health, safety, and environmental protection legislation.

    ROHS Compliance Certificate
    RoHS

    ROHS Compliant

    Eco-friendly manufacturing completely free from hazardous substances.

    UL Safety Certificate
    UL

    UL Certified

    Premium North American electrical security and fire prevention compliance standard.

    FAQ

    Q What is the working principle of the 172nm excimer lamp?

    The 172nm VUV excimer lamp generates high-energy vacuum ultraviolet light via gas discharge. It features high photon energy, far exceeding the bond energy of common organic molecules.

    With strong molecular bond breaking capacity, the light directly decomposes organic contaminants. It also produces reactive oxygen species to enhance cleaning and TOC removal effects.

    As a reliable Ushio excimer lamp alternative and Hamamatsu 172nm alternative, it fits semiconductor cleaning, cold plate cleaning, CDU & UPW water treatment, film matting and other industrial scenarios.

    Q Why choose GMY?

    1. GMY have 30 years of experience in UV lamp R&D and production with solid technical expertise.
    2. We provide customized solutions to match your actual application demands.
    3. Fast lead time: 30-45 days from design to finished products.
    4. Zero development cost, and customization is available even for single unit orders.

    Q Can this device be used for multiple application scenarios?

    Yes. It supports semiconductor wafer, PCB and various mask cleaning, as well as film matting and roller coating processes. Only minor adjustments are needed for different uses.
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If you are interested in our products and want to know more details,please leave a message here,we will reply you as soon as we can.

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If you are interested in our products and want to know more details,please leave a message here,we will reply you as soon as we can.
Contact Us:jwtan@gmyok.com