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Per- and polyfluoroalkyl substances (PFAS), as a class of highly bioaccumulative and toxic new persistent organic pollutants, are extremely difficult to degrade using traditional processes in water ecological remediation. Addressing this global environmental challenge, the latest environmental empirical research from Japan has delivered a new technological direction: utilizing 172nm excimer light high-energy radiation for photolysis and harmless treatment, providing a highly efficient physical elimination approach for these stubborn organic compounds.
Technical Background: The Dilemma of PFAS Remediation – “Permanent Chemicals”
PFAS (per- and polyfluoroalkyl substances) are typical synthetic organic compounds. Due to the extremely strong carbon-fluorine bonds in their molecular structure, they possess excellent chemical stability, heat resistance, and hydrophobic and oleophobic properties, and are widely used in various industrial manufacturing and consumer products. Because they are almost impossible to spontaneously degrade in nature, they are figuratively called “permanent chemicals” by the industry, posing a long-term and severe challenge to water safety.
172nm Excimer Photolysis Mechanism and Quantitative Efficiency
The process flow and core mechanism of 172nm excimer photolysis of PFAS are as follows:
Process Flow: First, PFAS in the fluid is extracted and aggregated at a high rate through pre-treatment recovery and concentration technology.
Reaction Mechanism: Subsequently, a 172nm excimer light source is introduced to input high-energy quantum radiation. Under the high-speed synergistic cleavage of water molecules, highly reactive hydroxyl radicals (·OH), and electrons, the molecular chains are directly broken.
Empirical Evidence: Experimental data confirms that even at high concentrations of mg/L, PFOA (perfluorooctanoic acid) and PFOS (perfluorooctane sulfonic acid) in water can achieve a degradation and removal rate of approximately 99% within a specific reaction cycle.
GMY: Industrial-Grade 172nm Excimer Light Source Solution Provider
GMY, leveraging its deep technological accumulation in the field of special electric light sources, has now built a comprehensive 172nm excimer light technology R&D matrix. Beyond cutting-edge water treatment and persistent pollutant degradation, our modular solutions are widely used in key processes such as industrial photo-cleaning, high-efficiency photopolymerization, surface hydrophobic modification, and TOC depth reduction in ultrapure water production.
We continuously deliver highly consistent specialty light source components and customized OEM/ODM services to research institutions, high-end manufacturers, and modern environmental engineering companies, using cutting-edge photonics technology to overcome the limits of environmental governance in various industries.
