172nm Excimer Module for Cold Plate

In advanced manufacturing industries such as semiconductors, display panels, precision optics, and microelectronics, surface cleanliness can directly influence product quality, process stability, and final manufacturing yield.   Traditional wet cleaning methods often rely on chemicals and solvents. While they can effectively remove contaminants, they may also leave chemical residues and introduce additional cleaning, rinsing, and drying processes. For sensitive and high-precision components, conventional cleaning methods may also create concerns about material damage.   Today, a new dry surface treatment technology based on 172nm excimer light is providing manufacturers with another solution. With its high-energy vacuum ultraviolet radiation and non-contact processing characteristics, 172nm Excimer Lamp technology can remove organic contamination while simultaneously activating the material surface, offering a cleaner and more efficient approach for precision surface treatment. The Technology Behind It: How Does 172nm Excimer Light Clean and Activate Surfaces? The 172nm wavelength belongs to the vacuum ultraviolet (VUV) range and provides high-energy photons capable of initiating powerful photochemical reactions. When 172nm VUV radiation reaches organic contaminants on a material surface, the high-energy photons can break molecular bonds and decompose organic compounds.   At the same time, in the presence of oxygen, VUV irradiation promotes the formation of reactive oxygen species that further oxidize and decompose organic residues.This creates a highly effective combination of photolysis and photo-oxidation.The result is a contactless dry-cleaning process that can remove organic contamination from precision surfaces without relying on conventional liquid cleaning agents.   Photochemical Cleaning: Removing Organic Contaminants The high-energy radiation of a 172nm Excimer Lamp can break down hydrocarbon chains, oil residues, organic contaminants, and other surface impurities.Reactive oxygen species then further oxidize these decomposed compounds, converting organic residues into simpler substances such as CO₂ and H₂O.   This makes 172nm VUV technology particularly suitable for removing microscopic organic contamination before critical manufacturing processes.Unlike mechanical cleaning, the process does not require direct physical contact with the substrate. Compared with conventional wet cleaning, it can also reduce dependence on chemical cleaning agents.   Surface Activation: Improving Hydrophilicity Cleaning is only one part of the process. The photochemical reaction generated by 172nm excimer light can also modify the chemical characteristics of the material surface. For non-polar materials, VUV irradiation can break hydrocarbon molecular chains and introduce polar hydrophilic groups such as hydroxyl (-OH) and carboxyl (-COOH) groups.   This increases the surface free energy and improves wettability. In practical applications, a surface that was originally hydrophobic can become significantly more hydrophilic after 172nm treatment, creating a better interface for subsequent coating, bonding, printing, and other processes. The Visible Result: Water Contact Angle Reveals Surface Activation Water contact angle is one of the most intuitive ways to evaluate surface wettability and surface condition. Before treatment, organic contamination or the naturally low surface energy of certain materials can cause a water droplet to remain rounded on the surface, resulting in a relatively large contact angle.   After treatment with a 172nm Excimer Lamp, the surface can become more hydrophilic, allowing the water droplet to spread across the substrate more easily. Instead of remaining as a spherical droplet, the water can form a more uniform film across the treated surface. This visible change in water contact angle provides a straightforward indication of improved surface wettability.   More importantly, improved wettability can help provide a better surface condition for subsequent manufacturing processes, including: Coating Thin-film deposition Bonding Printing Adhesive application Lamination For manufacturers working with high-precision materials, improving surface cleanliness and wettability before these processes can contribute to more consistent processing and better adhesion performance. Multiple Applications: Bringing 172nm VUV Technology to Advanced Manufacturing The combination of dry cleaning and surface activation makes 172nm excimer technology suitable for a wide range of precision manufacturing applications. Semiconductor Manufacturing For semiconductor wafers, MEMS components, and microelectronic devices, 172nm photo-cleaning can be used as a pre-treatment before critical processes such as bonding and thin-film deposition. Removing organic residues from silicon wafer substrates and other precision surfaces can help provide a cleaner interface for subsequent processing.   Display and Optoelectronic Manufacturing In OLED, LCD, and other display manufacturing processes, surface cleanliness and adhesion are critical. 172nm VUV technology can be used for cleaning substrates, evaporation masks, and other components where microscopic organic residues may affect subsequent coating or deposition processes.   Flexible Films and Polymer Materials Materials such as PET, PI, PP, PE, PMMA, PC, PVC, and PS can be treated using 172nm VUV surface modification. For roll-to-roll manufacturing, surface activation can improve wettability before coating, printing, laminating, or adhesive bonding, helping create a more suitable interface between different materials.   Precision Metal and Glass 172nm surface treatment can also be applied to materials such as titanium, aluminum foil, silicon wafers, and ITO glass. By modifying surface chemistry and increasing surface energy, the treatment can improve wettability without requiring direct mechanical contact with the substrate.   Medical and Dental Components Titanium is widely used in medical and dental components because of its excellent mechanical and corrosion-resistant properties. However, surface contamination and low wettability can affect subsequent processing and biological interactions.   Beyond Cleaning: 172nm Excimer Technology for Photocuring and Surface Finishing The application of 172nm excimer light is not limited to surface cleaning. Because of its high photon energy, 172nm excimer technology can also be used for surface matting and photocuring. The specific wavelength can directly interact with polymer molecular structures and initiate rapid photochemical reactions.   In surface finishing applications, this can help create a controlled micro-textured surface and achieve a more uniform matte appearance while improving surface hardness and scratch resistance. Potential applications include: Specialty coatings Structural bonding High-precision graphic printing High-speed inkjet printing 3D printing Packaging printing This makes 172nm technology a versatile light-based solution for both surface preparation and surface finishing. GMY 172nm Excimer Lamp: Reliable VUV Solutions for Precision Manufacturing As a professional light-source manufacturer, GMY develops 172nm excimer lamp solutions for advanced surface treatment applications.GMY's technology portfolio covers 172nm photo-cleaning, surface modification, hydrophilic activation, photocuring, and related precision manufacturing applications. Its semiconductor-industry solutions are designed for applications including silicon wafer substrates, semiconductor flat-panel displays, microelectronic ICs, high-precision optical components, photovoltaic manufacturing, biomedicine, and micro-nano manufacturing.   Rather than providing only a standalone light source, GMY can support customers with different levels of integration, from 172nm Excimer Lamps and lamp modules to customized application solutions.   What Makes GMY 172nm Excimer Solutions Different? Stable VUV Light Source: GMY develops 172nm excimer light sources for demanding industrial applications where stable and reliable UV output is essential. Dry and Non-Contact Processing: 172nm VUV treatment provides a contactless approach to organic contamination removal and surface activation, making it suitable for precision substrates and sensitive components. Surface Cleaning and Activation in One Process: Depending on the process configuration, the same 172nm technology can be used to remove organic contamination while improving surface wettability and surface energy. Application-Specific Customization: Different substrates and production lines require different irradiation areas, power levels, working distances, and mechanical configurations. GMY provides customized OEM and ODM solutions according to customer requirements. From Light Source to Integrated Solution: GMY works with manufacturers and equipment developers to provide solutions ranging from core 172nm excimer light sources to customized modules and application-specific systems.   As advanced manufacturing continues to move toward smaller structures, higher precision, and stricter contamination control, conventional surface treatment methods are facing new challenges. It combines high-energy VUV photochemistry with contactless dry processing to achieve: Organic contamination removal Surface activation Improved hydrophilicity Higher surface energy Better coating and bonding conditions Reduced reliance on wet chemical cleaning Flexible integration into precision manufacturing processes   From semiconductor wafers and OLED components to precision optics, flexible films, titanium implants, PCB materials, and advanced coatings, 172nm VUV technology is becoming an increasingly valuable tool for modern surface treatment.   If you are looking for a 172nm Excimer Lamp manufacturer for wafer cleaning, surface activation, hydrophilic modification, photocuring, or customized VUV equipment integration, GMY can provide application-oriented solutions based on your specific process requirements.   Explore GMY's 172nm Excimer Lamp solutions and discover how VUV technology can help improve your surface treatment process. Explore GMY 172nm Excimer Lamp Solutions